PRODUCTS
Enabling chip production at scale
The semiconductor industry is driven by affordable scaling, which is powered by ASML’s holistic lithography product portfolio
JUMP TO
Lithography systems
Refurbished systems
Metrology & inspection systems
Customer support
We provide our customers with everything they need – hardware, software and services – to mass produce patterns on silicon, allowing them to increase the value and lower the cost of a chip.
EUV lithography systems
Extreme ultraviolet
The TWINSCAN NXE:3400C is our latest-generation EUV lithography system, combining productivity, highest resolution, and state-of-the-art overlay and focus performance.
NXE3400C 2
TWINSCAN NXE 3400C
Supporting text: The TWINSCAN NXE:3400C is the successor of the NXE:3400B that will support EUV volume production at the 7 and 5 nm nodes at higher productivity.
TWINSCAN NXE 3400B
The TWINSCAN NXE 3400B will support EUV volume production at the 7 and 5 nm nodes.
DUV lithography systems
Deep ultraviolet
Immersion systems
TWINSCAN NXT:2000i
The TWINSCAN NXT:2000i is our state-of-the-art immersion lithography system currently being ramped in high-volume manufacturing of the 7 nm Logic and advanced DRAM nodes.
ASML TWINSCAN NXT:1980Di DUV lithography machine
TWINSCAN NXT:1980Di
Introduced in 2015, the TWINSCAN NXT:1980Di delivers high productivity with high reliability: system uptime is at > 97% worldwide.
ASML TWINSCAN NXT:1970Ci DUV lithography machine
TWINSCAN NXT:1970Ci
The TWINSCAN NXT:1970Ci delivers high productivity and excellent image resolution using a dual-stage concept.
ASML TWINSCAN NXT:1965Ci DUV lithography machine
TWINSCAN NXT:1965Ci
The TWINSCAN NXT:1965Ci delivers high productivity and excellent image resolution using a dual-stage concept.
Dry systems
ASML TWINSCAN XT:1460K DUV lithography machine
TWINSCAN XT:1460K
The TWINSCAN XT:1460K is our latest-generation dual-stage ‘dry’ lithography system, offering a 30% productivity increase over previous models.
ASML TWINSCAN XT:1060K DUV lithography machine
TWINSCAN XT:1060K
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser 'dry' lithography system.
ASML TWINSCAN XT:860M DUV lithography machine
TWINSCAN XT:860M
The TWINSCAN XT:860M is designed using state-of-the-art optics for volume 300 mm wafer production at and below 110 nm resolution.
ASML TWINSCAN XT:400L DUV lithography system
TWINSCAN XT:400L
The TWINSCAN XT:400L is ASML’s latest-generation i-line lithography system, using a mercury vapor lamp to print features down to 220 nm.
Refurbished systems
Almost every lithography system that we’ve ever shipped is still in use at a customer fab. We refurbish ‘classic’ PAS 5500 and TWINSCAN lithography systems for a new life and a new purpose.
Refurbished PAS 5500 systems
Download the product descriptions and specs
PAS 5500-1150C
PAS 5500-8TFH-A
PAS 5500-850C
PAS 5500-750F
PAS 5500-450F
PAS 5500-350C
PAS 5500-275D
PAS 5500-100D
Contact Refurbished Systems Sales
Metrology & inspection systems
Delivering speed and accuracy, our metrology and inspection portfolio covers every step of the manufacturing process, from R&D to mass production. Together with our computational lithography and patterning control software solutions, they help chipmakers achieve the highest yield and best performance in mass production.
YieldStar optical metrology
Our YieldStar optical metrology solutions can quickly and accurately measure the quality of patterns on the wafer.
ASML YieldStar 375F optical metrology system
YieldStar 375F
Fast and accurate pre-etch overlay and focus measurements, whatever your process conditions.
ASML YieldStar 380G optical metrology system
YieldStar 380G
The YieldStar 380G is the successor of the YieldStar 375F, providing even faster and more accurate after-develop overlay and focus measurements.
ASML YieldStar 1375F optical metrology system
YieldStar 1375F
Fast, accurate in-product overlay and CD metrology for after-etch process monitoring.
E-beam metrology and inspection
Our HMI e-beam solutions help to locate and analyze individual chip defects amid millions of printed patterns.
HMI eP5
Our highest resolution e-beam system offers CD metrology and defect detection for chip development and production monitoring.
HMI eScan 430
Fast e-beam inspection for process development and production monitoring for 3D NAND and other advanced chips.
HMI eScan 600
Flexible e-beam inspection solution that detects multiple defect types in one system.
Computational lithography
Our computational lithography and software solutions revolve around creating applications that enhance the setup of the lithography system, so that chipmakers can print exactly what they want to print. A foundational element for all these applications are accurate simulation models of the lithography process. These models represent a wide variety of physical and chemical effects. Machine learning solutions are now broadly used both in the simulation models as well as in the applications. Our solutions fall into two main areas:
Process window enhancement
Process window control
Customer support
At ASML, the customer always comes first. With more than 5,000 customer support employees, including service engineers and applications specialists, we make sure our systems in our customers’ fabs are running smoothly.
CustomerNet for ASML customers
CustomerNet
Register for CustomerNet
Forgot your password?
Contact Sales
Contact us via the contact form and we'll get back to you as soon as possible
Contact us
Related content
Technology
Learn about the technology behind our lithography, metrology & inspection, and software solutions.
About ASML
ASML is an innovation leader in the semiconductor industry. Find out what we do and why we do it.
Careers
Explore careers at ASML and join the high-tech semiconductor industry, where you can work on technology that can change the world.
Home
Products
LEARN
ASML at a glance
History
Products
Technology
Sustainability
News
ASML Foundation
WORK AT ASML
Job search
Careers
Organization
Locations
INVEST
Why invest in ASML
Financial results
Investor days
Shares
GET IN TOUCH
Contact information
Contact Media Relations
Contact Investor Relations
CustomerNet
ASML Net
SOCIAL MEDIA
Copyright © 2019 (ASML) All Rights Reserved
Privacy Notice Business Partners Privacy Notice Recruitment Cookie Notice